Coating System
We manufactures and supplies vacuum coating plants, metallization vacuum, plasma, pvd, pecvd, sputtering, kolzer, metallizer, sputtering plant, sputter system, metalizacao vacuo, metallisation vide, metalizacion vacio, know-how of industrial vacuum coating applications, continuous and discontinuous high vacuum metallizers, industrial processes of finish.
Filter
Showing all 6 results
For many applications, such as OLED, OPV and OTFT research, and graphene and 2D materials, samples are sensitive to oxygen and moisture and handling within inert environments is a must. In these cases, deposition tools must allow for transfer to and from glovebox enclosures with controlled inert atmospheres.
In addition to vacuum deposition, Moorfield can also equip glovebox-integrated tools with other hardware such as etching (including soft-etching) and annealing components.
For many applications, such as OLED, OPV and OTFT research, and graphene and 2D materials, samples are sensitive to oxygen and moisture and handling within inert environments is a must. In these cases, deposition tools must allow for transfer to and from glovebox enclosures with controlled inert atmospheres.
In addition to vacuum deposition, Moorfield can also equip glovebox-integrated tools with other hardware such as etching (including soft-etching) and annealing components.
μ-650c systems tools take the modular concept to the pilot-scale level. Large chambers allow for increased-size component sets for coating large areas, and a range of load-lock options enable high-throughput operation. At the same time, systems are fully customisable to match specific applications.
μ-570c systems have front-loading box-type chambers ideal for multiple-source magnetron sputtering but also thermal and e-beam evaporation.μ-570c systems are glovebox-compatible for atmosphere-sensitive applications.μ-570c systems offer tall chambers ideally suited for thermal, LTE and e-beam evaporation techniques requiring longer working distances for optimum uniformity.
μ-450c systems have front-loading box-type chambers ideal for multiple-source magnetron sputtering but also thermal and e-beam evaporation.μ-450c systems are glovebox-compatible for atmosphere-sensitive applications.
